Patent number: 7081711
Inductively generated streaming plasma ion source
Original Assignee: Applied Pulsed Power, Inc.
Field of technology: Electronics, Industrial Machinery and Processes
Patent granted on: Tue, 25 Jul 2006
Abstract
A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.